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After developing aberration correctors as modifications for microscopes, Nion developed their first microscope, called UltraSTEM 1, a new aberration corrected microscope with resolution capability below one
Angstrom.
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calling for a microscope built from the ground up with aberration correction in mind, which could have potential at reaching resolutions below 0.5
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at the time, and decided to approach the project with a new company. Krivanek and Dellby used a $ 120,000 grant from the
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In 2015, Nion delivered a Hermes
Scanning Transmission Electron Microscope priced at ÂŁ3.7 million to
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to build their first aberration corrector. Soon, Nion had constructed correctors for both
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569:"Kirkland master of the electron microscope wins one of science's biggest prizes"
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into existing STEMs. The publicity gained from this achievement led to the
540:"Electron microscope pinpoints position of single atoms | Laboratory Talk"
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In 2008, Nion unveiled the SuperSTEM 2, which provided 20 million times
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438:"Sub-ĂĄngstrom resolution using aberration corrected electron optics"
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aberration-corrected scanning transmission electron microscope
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405:"Kirkland microscopes can examine matter one atom at a time"
492:"IBM, Nion Create Highest-Resolution Electron Microscope"
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Batson, P. E.; Dellby, N.; Krivanek, O. L. (2002-08-08).
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In 2020, co-founder of Nion, Ondrej
Krivanek, shared the
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and Niklas Dellby were approached by Philip Batson from
212:. The SuperSTEM 2 was developed in collaboration with
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to build a STEM aberration corrector. Krivanek was a
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326:"Nion: The company that transformed microscopy"
1085:Serial block-face scanning electron microscopy
788:Detectors for transmission electron microscopy
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359:"The correction of electron lens aberrations"
271:, which moved Bruker into the manufacture of
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251:for Nanoscience for work creating the first
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598:"Meet the Winners of the 2020 Kavli Prize"
140:scanning transmission electron microscopes
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29:
27:American electron microscope manufacturer
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267:In January 2024, Nion was acquired by
259:below one ĂĄngstrom (0.1 nanometers).
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58:Scientific and Technical Instruments
25:
721:Timeline of microscope technology
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528:from the original on 2024-05-25.
504:from the original on 2024-05-25.
1080:Precession electron diffraction
641:from the original on 2024-05-23
608:from the original on 2023-09-22
579:from the original on 2023-06-03
550:from the original on 2024-05-25
415:from the original on 2016-03-25
339:from the original on 2024-05-24
306:from the original on 2024-05-19
123:Footnotes / references
628:"Bruker with Nion: The future"
375:10.1016/j.ultramic.2015.03.007
1:
626:Pool, Rebecca (2024-02-01).
357:Hawkes, P. W. (2015-09-01).
324:Pool, Rebecca (2022-11-21).
1383:
1065:Immune electron microscopy
983:Annular dark-field imaging
798:Everhart–Thornley detector
1307:
1219:Hitachi High-Technologies
167:TJ Watson Research Center
121:
35:
1244:Thermo Fisher Scientific
1070:Geometric phase analysis
958:Aberration-Corrected TEM
175:University of Washington
993:Charge contrast imaging
803:Field electron emission
296:"Nion Co. - About Nion"
214:University of Liverpool
1183:Thomas Eugene Everhart
516:"SuperSTEM 2 Unveiled"
1188:Vernon Ellis Cosslett
1008:Dark-field microscopy
218:University of Glasgow
1193:Vladimir K. Zworykin
843:Correlative light EM
752:Electron diffraction
273:electron microscopes
226:Daresbury Laboratory
195:scientific community
187:chromatic aberration
183:spherical aberration
1357:Electron microscopy
1158:Manfred von Ardenne
1143:Gerasimos Danilatos
1050:Electron tomography
1045:Electron holography
988:Cathodoluminescence
767:Secondary electrons
757:Electron scattering
701:Electron microscopy
687:Electron microscopy
602:Scientific American
462:10.1038/nature00972
454:2002Natur.418..617B
222:University of Leeds
32:
1280:Digital Micrograph
886:Environmental SEM
808:Field emission gun
772:X-ray fluorescence
635:Analytical Science
544:laboratorytalk.com
333:Analytical Science
171:research professor
18:Draft:Nion Company
1367:Materials science
1339:
1338:
1303:
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1173:Nestor J. Zaluzec
1168:Maximilian Haider
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573:The Seattle Times
521:Photonics Spectra
497:Photonics Spectra
448:(6898): 617–620.
409:The Seattle Times
142:(STEMs) based in
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16:(Redirected from
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1123:Bodo von Borries
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868:Photoemission EM
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1178:Ondrej Krivanek
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77:, Niklas Dellby
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575:. 2020-05-27.
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500:. 2002-08-14.
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1270:EM Data Bank
1234:Nion Company
1128:Dennis Gabor
1118:Albert Crewe
896:Confocal SEM
793:Electron gun
742:Auger effect
643:. Retrieved
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621:
610:. Retrieved
601:
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581:. Retrieved
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552:. Retrieved
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417:. Retrieved
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341:. Retrieved
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308:. Retrieved
300:www.nion.com
299:
266:
246:
230:
207:
203:
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136:manufacturer
131:
130:
122:
82:Headquarters
45:Company type
31:Nion Company
1214:FEI Company
1148:Harald Rose
1138:Ernst Ruska
827:Microscopes
735:with matter
733:interaction
263:Acquisition
249:Kavli Prize
191:retrofitted
1346:Categories
1295:Multislice
1111:Developers
971:Techniques
716:Microscope
711:Micrograph
645:2024-05-23
612:2024-05-23
583:2024-05-23
554:2024-05-24
419:2024-05-25
369:: A9–A12.
343:2024-05-24
310:2024-05-23
279:References
257:resolution
148:Washington
90:Washington
49:Subsidiary
1163:Max Knoll
818:Stigmator
470:1476-4687
383:0304-3991
199:Angstroms
158:In 1997,
1318:Category
1265:CrysTBox
1253:Software
924:Cryo-TEM
731:Electron
639:Archived
606:Archived
577:Archived
548:Archived
526:Archived
502:Archived
478:12167855
413:Archived
391:26025209
337:Archived
304:Archived
144:Kirkland
86:Kirkland
71:Founders
55:Industry
1330:Commons
978:4D STEM
951:4D STEM
929:Cryo-ET
901:SEM-XRF
891:CryoSEM
848:Cryo-EM
706:History
450:Bibcode
235:in the
154:History
108:Website
63:Founded
1275:EMsoft
1260:CASINO
1239:TESCAN
1104:Others
1003:cryoEM
694:Basics
476:
468:
442:Nature
389:
381:
269:Bruker
243:Awards
224:, and
102:Bruker
97:Parent
1229:Leica
1075:PINEM
941:HRTEM
936:EFTEM
633:Wiley
331:Wiley
255:with
233:EPSRC
134:is a
1290:IUCr
1224:JEOL
1095:WBDF
1090:WDXS
1040:EBIC
1035:EELS
1030:ECCI
1018:EBSD
998:CBED
946:STEM
474:PMID
466:ISSN
387:PMID
379:ISSN
185:and
132:Nion
115:.com
113:nion
66:1997
1060:FEM
1055:FIB
1023:TKD
1013:EDS
916:TEM
878:SEM
853:EMP
458:doi
446:418
371:doi
367:156
173:at
164:IBM
138:of
1348::
835:EM
637:.
630:.
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428:^
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287:^
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239:.
237:UK
228:.
220:,
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679:e
672:t
665:v
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373::
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313:.
20:)
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