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can be transferred and a circuit can be fabricated. The image shows a wafer of 6" (125 mm) diameter that has been mounted on the vacuum chuck and is ready for spinning. The user dispenses a drop of photoresist in the center of the wafer and the
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433:– You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
323:– You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
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232:; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled
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This file contains additional information, probably added from the digital camera or scanner used to create or digitize it.
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spreads the fluid into an even film, eliminating excess photoresist at the edge of the wafer in the process.
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Permission is granted to copy, distribute and/or modify this document under the terms of the
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A '''spinner''' is used to apply a thin even coating of
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I, the copyright holder of this work, hereby publish it under the following licenses:
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Micro e nanotecnologia/Microtecnologia/Tecniche litografiche/Litografia ottica
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Click on a date/time to view the file as it appeared at that time.
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This licensing tag was added to this file as part of the GFDL
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can be transferred and a circuit can be fabricated. The i
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Add a one-line explanation of what this file represents
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Creative
Commons Attribution-ShareAlike 3.0 Unported
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Commons is a freely licensed media file repository.
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347:.
238:.
201:)
197:(
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113:.
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