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These processes differ in speed and cost, as well as in the material they can be applied to and the range of feature sizes they can produce. For instance, while the size of features achievable with photolithography is limited by the wavelength of the light used, the technique it is considerably
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M. Paturzo, S. Grilli, S. Mailis, G. Coppola, M. Iodice, M. Gioffré, P. Ferraro (2008): "Flexible coherent diffraction lithography by tunable phase arrays in lithium niobate crystals".
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operations. The term is normally used for processes that can reliably produce features of microscopic size, such as 10
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S. Grilli, V. Vespini, P. Ferraro (2008): "Surface-charge lithography for direct PDMS micro-patterning".
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faster and simpler than electron beam lithography, that can achieve much smaller ones.
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is a general name for any manufacturing process that can create a minutely patterned
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This article is about semiconductor technology. For printing on paper, see
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may be used to designate processes that can produce
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155:The main application for microlithography is
91:Specific microlithography processes include:
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167:. They can also be used to create
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204:Handbook of VLSI Microlithography
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309:. You can help Knowledge by
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136:Surface-charge lithography
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Text is available under the Creative Commons Attribution-ShareAlike License. Additional terms may apply.