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Photograph of free-standing Silicon source being locally heated by a 400W 1030nm disc laser, for the purpose of Thermal Laser Epitaxy, a technique for the growth of thin films. A liquid phase can clearly be seen on the surface of the source, whilst the rest of the source remains solid. This
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Photograph of free-standing Silicon disc being locally heated by a laser in Thermal Laser Epitaxy.
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eliminates the need for crucibles that are needed in other deposition techniques
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File:Silicon-TLE.jpg
Silicon-TLE.jpg
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https://lia.scitation.org/doi/abs/10.2351/7.0000348
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16:49, 8 September 2021
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Thermal laser epitaxy
Epitaxia tèrmica làser
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