330:(DNQ), a chemical compound used for dissolution inhibition of novolak resin in photomask creation. They mathematically modeled effects, predicted possible optimizations, and experimentally verified their predictions. They found that chemically bonding together three of the molecules of DNQ to create a new molecule containing three dissolution inhibitors in a single molecule, led to a better feature contrast, with better resolution and miniaturization. These modified DNQs became known as "polyfunctional photoactive components" (PACs). This approach, which they termed polyphotolysis, has also been referred to as the "Trefonas Effect." The technology of trifunctional diazonaphthoquinone PACs has become the industry standard in positive photoresists. Their mechanism has been elucidated and relates to a cooperative behavior of each of the three DNQ units in the new trifunctional dissolution inhibitor molecule. Phenolic strings from the acceptor groups of PACs that are severed from their anchors may reconnect to living strings, replacing two shorter polarized strings with one longer polarized string.
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323:. These materials and techniques make it possible to fit more circuits into a given area. Over time, lithographic technologies have developed to allow lithography to use smaller wavelengths of light. Trefonas has helped to overcome a number of apparent limits to the sizes that are achievable, developing photoresists that are responsive to 436-nm and 365-nm ultraviolet light, and as small as 193 nm deep.
877:
333:
Trefonas has also been a leader in the development of fast etch organic Bottom
Antireflective Coating (BARC) BARC technology minimizes the reflection of light from the substrate when imaging the photoresist. Light that is used to form the latent image in the photoresist film can reflect back from
875:, Michael K. Templeton; Anthony Zampini & Peter Trefonas III et al., "Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate", published July 7, 1992, assigned to Shipley Company Inc.
295:
in late 1984. In 1986, he and others co-founded Aspect
Systems Inc., utilizing photolithography technology acquired from MEMC. Trefonas worked at Aspect from 1986-1989. Then, through a succession of company acquisitions, he moved to Shipley Company (1990-2000),
1360:
1244:
Trefonas, Peter; Thackeray, James W.; Sun, Guorong; Cho, Sangho; Clark, Corrie; Verkhoturov, Stanislav V.; Eller, Michael J.; Li, Ang; Pavia-Sanders, Adriana; Schweikert, Emile A.; Wooley, Karen L. (16 December 2013).
357:
in 2018 for the "invention of photoresist materials and microlithography methods underpinning multiple generations of microelectronics". DuPont
Company in 2019 recognized Trefonas with its top recognition, the
456:
Note
Correction, published in October: 'Sept. 12, page 27: A feature story profiling Dow Chemical's Peter Trefonas incorrectly identified when Dow acquired Rohm and Haas. The acquisition occurred in 2009, not
334:
the substrate and compromise feature contrast and profile shape. Controlling interference from reflected light results in the formation of a sharper pattern with less variability and a larger process window.
319:. By understanding the chemistry of photoresists used in lithography, he has been able to develop anti-reflective coatings and polymer photoresists that support finely-tuned etching used in the production of
894:
Microelectronic materials and processes : [proceedings of the NATO Advanced Study
Institute on Microelectronic Materials and Processes, Il Ciocco, Castelvecchio Pascoli, Italy, June 30-July 11,
804:
829:
Trefonas III, Peter; Blacksmith, Robert F.; Szmanda, Charles R.; Kavanagh, Robert J.; Adams, Timothy G. (June 11, 1999). "Organic antireflective coatings for 193-nm lithography".
303:
Trefonas has published at least 132 journal articles and technical publications. He has received 107 American patents, and has more than 15 active patent applications pending.
203:
for computer chips. This work has supported the patterning of smaller features during the lithographic process, increasing miniaturization and microprocessor speed.
326:
In 1989, Trefonas and others at Aspect
Systems Inc. reported on extensive studies of polyfunctional photosensitive groups in positive photoresists. They studied
283:
to create organosilicon bilayer photoresists. His thesis topic was "Synthesis, properties and chemistry of organosilane and organogermane high polymers" (1985).
1120:
161:
1010:
Han, Yu-Kai; Yan, Zhenglin; Reiser, Arnost (December 1999). "Mechanism of the
Trefonas Effect (Polyphotolysis) in NovolakâDiazonaphthoquinone Resists".
409:
2013, SPIE C. Grant
Willson Best Paper Award in Patterning Materials and Processes jointly with researchers at Dow and Texas A&M University, from
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406:(one of thirteen scientists from the Dow Chemical Company credited with the development of Dow AR Fast Etch Organic Bottom Antireflectant Coatings)
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362:, for "commercialized electronic chemicals which enabled customers to manufacture integrated circuits with higher density and faster speeds".
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for the paper "Bottom-up / top-down high-resolution, high-throughput lithography using vertically assembled block brush polymers".
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345:, for the development of Fast Etch Organic Bottom Antireflective Coatings (BARCs). In 2016, Trefonas was recognized with The SCI
1146:
381:
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63:
316:
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1247:"Bottom-up/top-down, high-resolution, high-throughput lithography using vertically assembled block bottle brush polymers"
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1220:"Dow Electronic Materials and Texas A&M University Win SPIE's 2013 Willson Award for Best Technical Paper"
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for "achievements in design for manufacturing & compact modeling." Peter
Trefonas was elected to the
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for outstanding contributions to industrial chemistry. In 2018, Trefonas was named as a Fellow of the
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Peter
Trefonas is a son of Louis Marco Trefonas, also a chemist, and Gail Thames. He was inspired by
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805:"Peter Trefonas, 2016 Perkin Medal Recipient, Credits Chemistry for Enabling the Information Age"
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300:(1997-2008), to The Dow Chemical Company (2008-2019), and finally to DuPont (2019-current).
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275:, completing a Ph.D. in inorganic chemistry in late 1984. Trefonas became interested in
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1047:"Mechanism of the Trefonas effect (Polyphotolysis) in dissolution inhibition resists"
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Synthesis, properties and chemistry of organosilane and organogermane high polymers
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While an undergraduate, Trefonas earned money by writing video games for early
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776:"SCI Awards Perkin Medal To Dow's Peter Trefonas By Chemical Processing Staff"
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145:
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36:
962:"New Principle for Image Enhancement in Single Layer Positive Photoresists"
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1172:"National Academy of Engineering Elects 83 Members and 16 Foreign Members"
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162:"Dow Chemical - Dow AR Fast Etch Organic Bottom Antireflectant Coatings"
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University of WisconsinâMadison College of Letters and Science alumni
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221:, and created his own chemistry lab at home. Trefonas attended the
1171:
745:"Peter Trefonas: Chemistry is key player in lithography process"
444:"C&EN talks with Peter Trefonas, photolithography innovator"
410:
387:
350:
149:
146:"Peter Trefonas: Chemistry is key player in lithography process"
176:(born 1958) is a retired DuPont Fellow (a senior scientist) at
280:
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Proc. SPIE 3678, Advances in Resist Technology and Processing
225:, receiving his Bachelor of Science in chemistry in 1980.
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for home computers. Trefonas also wrote a game based on
254:
was the first of what would become many games in the
960:
Trefonas III, P.; Daniels, B. K. (August 25, 1987).
932:(2nd ed.). Boca Raton: CRC Press. p. 130.
833:. Advances in Resist Technology and Processing XVI.
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104:
94:
69:
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47:
25:
18:
690:"Dow Chemical to buy Rohm and Haas for $ 15.3 bln"
1251:Journal of Micro/Nanolithography, MEMS, and MOEMS
966:SPIE Advances in Resist Technology and Processing
1051:Advances in Resist Technology and Processing XVI
898:. Dordrecht: Kluwer Academic. pp. 333â334.
337:In 2014, Trefonas and others at Dow were named
311:Throughout his career, Trefonas has focused on
1045:Han, Yu-Kai; Reiser, Arnost (June 11, 1999).
279:after working with West and chip makers from
8:
180:, where he had worked on the development of
716:"Dow Chemical Closes Rohm & Haas Deal"
688:Rocha, Euan; Daily, Matt (July 10, 2008).
15:
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926:Suzuki, Kazuaki; Smith, Bruce W. (2007).
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1147:"Litho University: DBARC Technology 101"
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402:2014, ACS Heroes of Chemistry, from the
236:, a clone of the 1976 arcade video game
929:Microlithography science and technology
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442:Reisch, Marc S. (September 12, 2016).
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184:. He is known for innovations in the
7:
1145:Cameron, Jim (November 18, 2015).
246:(1977), which itself was based on
188:, particularly the development of
14:
242:, and a clone of the arcade game
1356:University of New Orleans alumni
1331:Polymer scientists and engineers
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1053:. Vol. 3678. p. 360.
448:Chemical & Engineering News
382:National Academy of Engineering
355:National Academy of Engineering
269:University of Wisconsin-Madison
64:University of Wisconsin-Madison
1351:21st-century American chemists
1346:20th-century American chemists
1:
1224:Dow Electronic Materials News
714:Campoy, Ana (April 2, 2009).
317:chemistry of photolithography
186:chemistry of photolithography
398:Society of Chemical Industry
29:1958 (age 65–66)
1382:
1316:American physical chemists
1121:"2014 Heroes of Chemistry"
498:"Dr. Louis Marco Trefonas"
386:2018, named Fellow of the
148:, Micro/Nano Lithography,
1271:10.1117/1.JMM.12.4.043006
1049:. In Conley, Will (ed.).
668:University of New Orleans
533:Science History Institute
404:American Chemical Society
371:2021, ACS Carothers Award
343:American Chemical Society
293:MEMC Electronic Materials
223:University of New Orleans
155:
139:
126:
87:
60:University of New Orleans
1151:Dow Electronic Materials
809:DOW Electronic Materials
664:"Alumni: Peter Trefonas"
638:Trefonas, Peter (1985).
267:Trefonas studied at the
199:that are used to create
190:anti-reflective coatings
73:ACS Heroes of Chemistry
1366:Chemists from Minnesota
1341:People from New Orleans
1336:Chemists from Louisiana
1263:2013JMM&M..12d3006T
743:SPIE (22 August 2016).
720:The Wall Street Journal
592:"Retro Corner: 'Snake'"
1125:ACS Chemistry for Life
555:Gerard Goggin (2010),
261:Dungeons & Dragons
256:snake video game genre
380:2018, elected to the
374:2019, DuPont Company
891:Levy, R. A. (1989).
563:Taylor & Francis
277:electronic materials
217:and the writings of
182:electronic materials
1196:"2017 SPIE Fellows"
1059:1999SPIE.3678..360H
1024:1999MaMol..32.8421H
978:1987SPIE..771..194T
843:1999SPIE.3678..702T
780:Chemical Processing
757:10.1117/2.201608.02
558:Global Mobile Media
339:Heroes of Chemistry
328:diazonaphthoquinone
321:integrated circuits
1321:Inorganic chemists
528:"SCI Perkin Medal"
230:personal computers
1067:10.1117/12.350219
1032:10.1021/ma990686j
1018:(25): 8421â8426.
986:10.1117/12.940326
851:10.1117/12.350257
572:978-0-415-46917-3
366:Awards and honors
313:materials science
232:. These included
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89:Scientific career
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56:Alma mater
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782:. May 10, 2016
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394:Perkin Medal
347:Perkin Medal
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219:Isaac Asimov
212:
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197:photoresists
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109:Dow Chemical
105:Institutions
88:
79:Perkin Medal
1306:1958 births
1176:NAE Website
627:. May 1980.
596:Digital Spy
396:, from the
273:Robert West
121:Robert West
99:Lithography
48:Nationality
33:Minneapolis
1300:Categories
1205:2018-02-17
1181:2018-02-17
625:Gametronik
578:2011-04-07
418:References
1279:123535313
1229:March 20,
1100:ignored (
1090:cite book
895:1986]
859:138376696
248:Blockcade
214:Star Trek
207:Education
201:circuitry
37:Minnesota
1284:12 April
1200:spie.org
1130:12 April
1075:95748950
994:96668019
945:13 April
911:12 April
786:12 April
725:20 April
699:12 April
673:12 April
648:11 April
602:12 April
540:24 March
507:20 April
482:12 April
315:and the
307:Research
239:Blockade
51:American
1259:Bibcode
1055:Bibcode
1020:Bibcode
974:Bibcode
839:Bibcode
694:Reuters
341:by the
194:polymer
1277:
1156:30 May
1080:30 May
1073:
992:
936:
902:
879:
857:
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457:2001.'
392:2016,
287:Career
244:Hustle
178:DuPont
95:Fields
70:Awards
1275:S2CID
1071:S2CID
990:S2CID
855:S2CID
621:(PDF)
271:with
1286:2017
1231:2014
1158:2017
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