Knowledge (XXG)

Reflectance difference spectroscopy

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monitoring of epitaxial growth or the interaction of surfaces with adsorbates. To assign specific features in the signal to their origin in morphology and electronic structure, theoretical modelling by
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May, M. M.; Lewerenz, H.-J.; Hannappel, T. (2014), "Optical in situ Study of InP(100) Surface Chemistry: Dissociative Adsorption of Water and Oxygen",
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Aspnes, D. E.; Studna, A. A. (1985), "Anisotropies in the Above-Band-Gap Optical Spectra of Cubic Semiconductors",
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Richter, W.; Zettler, J.-T. (1996), "Real-time analysis of III--V-semiconductor epitaxial growth",
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Weightman, P; Martin, D S; Cole, R J; Farrell, T (2005), "Reflection anisotropy spectroscopy",
137:{\displaystyle RDS=2{\frac {r_{\alpha }-r_{\beta }}{r_{\alpha }+r_{\beta }}},r\in \mathbb {C} } 323: 218: 415: 379: 353: 315: 273: 403: 349: 311: 269: 207: 458: 357: 277: 285: 23: 319: 27: 214: 327: 203:
The method was introduced in 1985 for the study optical properties of the
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that are shone in normal incident on a surface with different
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Peter Y. Yu, Manuel Cardona ,"Fundamentals of Semiconductors"
217:. Due to its high surface sensitivity and independence of 419: 179: 152: 50: 200:
are the reflectance in two different polarizations.
192: 165: 136: 439: 8: 26:technique which measures the difference in 446: 432: 383: 184: 178: 157: 151: 130: 129: 111: 98: 86: 73: 66: 49: 239: 7: 400: 398: 17:Reflectance difference spectroscopy 418:. You can help Knowledge (XXG) by 14: 402: 372:Journal of Physical Chemistry C 221:, its use has been expanded to 258:Reports on Progress in Physics 1: 358:10.1016/0169-4332(96)00321-2 320:10.1103/PhysRevLett.54.1956 166:{\displaystyle r_{\alpha }} 496: 480:Analytical chemistry stubs 397: 278:10.1088/0034-4885/68/6/R01 193:{\displaystyle r_{\beta }} 228:density functional theory 342:Applied Surface Science 300:Physical Review Letters 194: 167: 138: 475:Scientific techniques 344:, 100--101: 465–477, 195: 168: 139: 41:It is calculated as: 470:Analytical chemistry 412:analytical chemistry 177: 150: 48: 36:linear polarizations 410:This article about 350:1996ApSS..100..465R 312:1985PhRvL..54.1956A 270:2005RPPh...68.1251W 190: 163: 134: 465:Materials science 427: 426: 385:10.1021/jp502955m 306:(17): 1956–1959, 219:ultra-high vacuum 118: 487: 448: 441: 434: 406: 399: 389: 388: 387: 367: 361: 360: 337: 331: 330: 295: 289: 288: 253: 247: 244: 199: 197: 196: 191: 189: 188: 172: 170: 169: 164: 162: 161: 143: 141: 140: 135: 133: 119: 117: 116: 115: 103: 102: 92: 91: 90: 78: 77: 67: 30:of two beams of 495: 494: 490: 489: 488: 486: 485: 484: 455: 454: 453: 452: 395: 393: 392: 369: 368: 364: 339: 338: 334: 297: 296: 292: 255: 254: 250: 245: 241: 236: 180: 175: 174: 153: 148: 147: 107: 94: 93: 82: 69: 68: 46: 45: 12: 11: 5: 493: 491: 483: 482: 477: 472: 467: 457: 456: 451: 450: 443: 436: 428: 425: 424: 407: 391: 390: 362: 332: 290: 248: 238: 237: 235: 232: 208:semiconductors 187: 183: 160: 156: 145: 144: 132: 128: 125: 122: 114: 110: 106: 101: 97: 89: 85: 81: 76: 72: 65: 62: 59: 56: 53: 13: 10: 9: 6: 4: 3: 2: 492: 481: 478: 476: 473: 471: 468: 466: 463: 462: 460: 449: 444: 442: 437: 435: 430: 429: 423: 421: 417: 413: 408: 405: 401: 396: 386: 381: 378:(33): 19032, 377: 373: 366: 363: 359: 355: 351: 347: 343: 336: 333: 329: 325: 321: 317: 313: 309: 305: 301: 294: 291: 287: 283: 279: 275: 271: 267: 263: 259: 252: 249: 243: 240: 233: 231: 230:is required. 229: 224: 220: 216: 212: 209: 206: 201: 185: 181: 158: 154: 126: 123: 120: 112: 108: 104: 99: 95: 87: 83: 79: 74: 70: 63: 60: 57: 54: 51: 44: 43: 42: 39: 37: 33: 29: 25: 24:spectroscopic 21: 18: 420:expanding it 409: 394: 375: 371: 365: 341: 335: 303: 299: 293: 261: 257: 251: 242: 202: 146: 40: 19: 16: 15: 264:(6): 1251, 28:reflectance 459:Categories 234:References 215:germanium 186:β 159:α 127:∈ 113:β 100:α 88:β 80:− 75:α 328:10031185 286:94037903 346:Bibcode 308:Bibcode 266:Bibcode 223:in situ 211:silicon 326:  284:  414:is a 282:S2CID 205:cubic 32:light 22:is a 20:(RDS) 416:stub 324:PMID 213:and 173:and 380:doi 376:118 354:doi 316:doi 274:doi 461:: 374:, 352:, 322:, 314:, 304:54 302:, 280:, 272:, 262:68 260:, 447:e 440:t 433:v 422:. 382:: 356:: 348:: 318:: 310:: 276:: 268:: 182:r 155:r 131:C 124:r 121:, 109:r 105:+ 96:r 84:r 71:r 64:2 61:= 58:S 55:D 52:R

Index

spectroscopic
reflectance
light
linear polarizations
cubic
semiconductors
silicon
germanium
ultra-high vacuum
in situ
density functional theory
Bibcode
2005RPPh...68.1251W
doi
10.1088/0034-4885/68/6/R01
S2CID
94037903
Bibcode
1985PhRvL..54.1956A
doi
10.1103/PhysRevLett.54.1956
PMID
10031185
Bibcode
1996ApSS..100..465R
doi
10.1016/0169-4332(96)00321-2
doi
10.1021/jp502955m
Stub icon

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