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Reliability (semiconductor)

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for that population as at-risk outliers not suitable for high reliability applications. Tester-based Parts Average Testing varieties include Parametric Parts Average Testing (P-PAT) and Geographical Parts Average Testing (G-PAT), among others. Inline Parts Average Testing (I-PAT) uses data from production process control inspection and metrology to perform the outlier recognition function.
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Q100 and Q101 stress qualifications. Parts Average Testing is a statistical method for recognizing and quarantining semiconductor die that have a higher probability of reliability failures. This technique identifies characteristics that are within specification but outside of a normal distribution
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devices are very sensitive to impurities and particles. Therefore, to manufacture these devices it is necessary to manage many processes while accurately controlling the level of impurities and particles. The finished product quality depends upon the many layered relationship of each interacting
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tests the packaged device, often pre-, and post burn-in for a set of parameters that assure operation. Process and design weaknesses are identified by applying a set of stress tests in the qualification phase of the semiconductors before their market introduction e. g. according to the
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Bond strength measurement is performed in two basic types: pull testing and shear testing. Both can be done destructively, which is more common, or non destructively. Non destructive tests are normally used when extreme reliability is required such as in military or aerospace applications.
239:, semiconductor products are manufactured in high volume. Furthermore, repair of finished semiconductor products is impractical. Therefore, incorporation of reliability at the design stage and reduction of variation in the production stage have become essential. 587:"D.W. Price and R.J. Rathert (KLA-Tencor Corp.). "Best Known Methods for Latent Reliability Defect Control in 90nm – 14nm Semiconductor Fabs". Nineteenth Annual Automotive Electronics Reliability Workshop. Novi, Michigan. April 2017" 669:
MIL-STD-1686B Electrostatic Discharge Control Program for Protection of Electrical and Electronic Parts, Assemblies and Equipment (Excluding Electrically Initiated Explosive Devices)
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Reliability of semiconductor devices may depend on assembly, use, environmental, and cooling conditions. Stress factors affecting device reliability include
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Due to the rapid advances in technology, many new devices are developed using new materials and processes, and design calendar time is limited due to
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of a semiconductor device is the ability of the device to perform its intended function during the life of the device in the field.
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Akbari, Mohsen; Tavakoli Bina, Mohammad; Bahman, Amir Sajjad; Eskandari, Bahman; Pouresmaeil, Edris; Blaabjerg, Frede (2021).
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MIL-HDBK-781 Reliability Test Methods, Plans and Environments for Engineering Development, Qualification and Production
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MIL-HDBK-H 108 Sampling Procedures and Tables for Life and Reliability Testing (Based on Exponential Distribution)
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There are multiple considerations that need to be accounted for when developing reliable semiconductor devices:
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Other Temperature Effects—Accelerated Aging, Increased Electro-migration with temperature, Increased Burn-Out
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concerns. Consequently, it is not possible to base new designs on the reliability of existing devices.
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MIL-STD-1629A Procedures for Performing a Failure Mode, Effects, and Criticality Analysis
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Package molding contamination—impurities in packaging compounds cause electrical failure
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Failure mechanisms of electronic semiconductor devices fall in the following categories
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Hydrogen effects – Hydrogen induced breakdown of portions of the circuit (Metal)
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Akbari, M.; Bahman, A.S.; Reigosa, P.D.; Iannuzzo, F.; Bina, M.T. (September 2018).
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MIL-STD-1543B Reliability Program Requirements for Space and Missile Systems
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MIL-STD-2164 Environment Stress Screening Process for Electronic Equipment
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Humidity effects – moisture absorption by the package and circuit
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MIL-STD-721C Definition of Terms for Reliability and Maintainability
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Reliability of semiconductors is kept high through several methods.
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MIL-HDBK-344 Environmental Stress Screening of Electronic Equipment
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Hot Electron Trapping – due to overdrive in power RF circuits
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and must be fully understood as they apply to metallization and
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Solder joint failure by creep fatigue or intermetallics cracks.
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MIL-HDBK-217F Reliability Prediction of Electronic Equipment
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Reliability of Electronic Packages and Semiconductor Devices
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Die-pad/molding compound delamination due to thermal cycling
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Design factors affecting semiconductor reliability include:
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MIL-STD-2074 Failure Classification for Reliability Testing
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MIL-STD-690C Failure Rate Sampling Plans and Procedures
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MIL-HDBK-251 Reliability/Design Thermal Applications
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MIL-HDBK-338 Electronic Reliability Design Handbook
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may be too technical for most readers to understand
657:MIL-STD-756B Reliability Modeling and Prediction 628:A. Christou & B.A. Unger (Dec 31, 1989), 8: 392:Environmentally induced failure mechanisms. 50:Learn how and when to remove these messages 492:Environmentally induced failure mechanisms 202:substance in the semiconductor, including 740: 176:Learn how and when to remove this message 158:Learn how and when to remove this message 142:, without removing the technical details. 103:Learn how and when to remove this message 389:Mechanically induced failure mechanisms. 383:Material-interaction-induced mechanisms. 712:"Reliability Standards & Handbooks" 550: 465:Mechanically induced failure mechanisms 397:Material-interaction-induced mechanisms 604:. Global SMT & Packaging magazine. 213:The problems of micro-processes, and 140:make it understandable to non-experts 7: 701:"Basic Failure Modes and Mechanisms" 436:Burnout – localized overstress 534:List of materials-testing resources 681:Semiconductor Reliability Handbook 539:List of materials analysis methods 14: 619:Giulio Di Giacomo (Dec 1, 1996), 425:Stress-induced failure mechanisms 31:This article has multiple issues. 797:Semiconductor device fabrication 630:Semiconductor Device Reliability 446:, High Electro-Magnetic Fields ( 119: 61: 20: 208:list of semiconductor materials 39:or discuss these issues on the 772:10.1016/j.microrel.2018.07.150 1: 764:Microelectronics Reliability 742:10.1109/ACCESS.2021.3083063 813: 442:Electrical Stress – 386:Stress-induced mechanisms. 349:controls processing, and 226:non-recurring engineering 600:Sykes, Bob (June 2010). 317:; logic timing margins ( 75:may need to be rewritten 632:, NATO Science Series E 444:Electrostatic discharge 403:Field-effect transistor 337:Methods of improvement 417:Surface-state effects 766:. 88–90: 1135–1140. 345:control impurities, 718:on 8 November 2005. 694:on 1 December 2006. 414:Channel degradation 286:, and intensity of 405:gate-metal sinking 375:Failure mechanisms 228:constraints, plus 602:"Why test bonds?" 268:mechanical stress 250:, contamination, 206:, chip material ( 186: 185: 178: 168: 167: 160: 113: 112: 105: 85:lead layout guide 54: 804: 783: 754: 744: 719: 714:. Archived from 707: 705: 695: 693: 686: 633: 624: 606: 605: 597: 591: 590: 583: 577: 576: 574: 566: 560: 555: 519:Failure analysis 514:Transistor aging 431:Electromigration 319:logic simulation 237:economy of scale 181: 174: 163: 156: 152: 149: 143: 123: 122: 115: 108: 101: 97: 94: 88: 81:improve the lead 65: 64: 57: 46: 24: 23: 16: 812: 811: 807: 806: 805: 803: 802: 801: 787: 786: 757: 735:: 84217–84230. 722: 710: 703: 698: 691: 684: 678: 627: 618: 615: 610: 609: 599: 598: 594: 585: 584: 580: 572: 568: 567: 563: 556: 552: 547: 510: 494: 467: 427: 399: 377: 347:process control 339: 331:process control 323:timing analysis 182: 171: 170: 169: 164: 153: 147: 144: 136:help improve it 133: 124: 120: 109: 98: 92: 89: 78: 66: 62: 25: 21: 12: 11: 5: 810: 808: 800: 799: 789: 788: 785: 784: 755: 720: 708: 696: 676: 673: 670: 667: 664: 661: 658: 655: 652: 649: 646: 643: 640: 637: 634: 625: 614: 611: 608: 607: 592: 578: 561: 549: 548: 546: 543: 542: 541: 536: 531: 526: 521: 516: 509: 506: 505: 504: 501: 498: 493: 490: 489: 488: 485: 482: 475: 466: 463: 462: 461: 440: 437: 434: 426: 423: 422: 421: 418: 415: 412: 406: 398: 395: 394: 393: 390: 387: 384: 376: 373: 338: 335: 329:derating; and 296: 295: 240: 233: 230:time to market 222: 211: 210:) and package. 184: 183: 166: 165: 127: 125: 118: 111: 110: 70:The article's 69: 67: 60: 55: 29: 28: 26: 19: 13: 10: 9: 6: 4: 3: 2: 809: 798: 795: 794: 792: 781: 777: 773: 769: 765: 761: 756: 752: 748: 743: 738: 734: 730: 726: 721: 717: 713: 709: 702: 697: 690: 683: 682: 677: 674: 671: 668: 665: 662: 659: 656: 653: 650: 647: 644: 641: 638: 635: 631: 626: 623:, McGraw-Hill 622: 617: 616: 612: 603: 596: 593: 588: 582: 579: 571: 565: 562: 559: 558:AEC Documents 554: 551: 544: 540: 537: 535: 532: 530: 527: 525: 522: 520: 517: 515: 512: 511: 507: 502: 499: 496: 495: 491: 486: 483: 480: 476: 473: 469: 468: 464: 460: 456: 453: 449: 445: 441: 438: 435: 432: 429: 428: 424: 419: 416: 413: 410: 409:Ohmic contact 407: 404: 401: 400: 396: 391: 388: 385: 382: 381: 380: 374: 372: 368: 365: 360: 356: 352: 348: 344: 336: 334: 332: 328: 324: 320: 316: 315:metastability 312: 309: 305: 301: 293: 289: 285: 281: 277: 273: 269: 265: 261: 257: 253: 249: 245: 241: 238: 234: 231: 227: 223: 220: 216: 212: 209: 205: 204:metallization 200: 199:Semiconductor 197: 196: 195: 192: 190: 180: 177: 162: 159: 151: 141: 137: 131: 128:This article 126: 117: 116: 107: 104: 96: 86: 83:and read the 82: 76: 73: 68: 59: 58: 53: 51: 44: 43: 38: 37: 32: 27: 18: 17: 763: 732: 728: 716:the original 689:the original 680: 629: 620: 613:Bibliography 595: 581: 564: 553: 378: 369: 355:wafer prober 340: 297: 219:wire bonding 193: 188: 187: 172: 154: 148:October 2017 145: 129: 99: 93:October 2017 90: 79:Please help 74: 72:lead section 47: 40: 34: 33:Please help 30: 729:IEEE Access 699:Kayali, S. 477:Die-attach 459:overcurrent 455:overvoltage 411:degradation 327:temperature 260:temperature 235:To achieve 189:Reliability 570:"AEC Q001" 545:References 359:Final test 343:Cleanrooms 292:electrical 215:thin films 36:improve it 751:235455172 524:Cleanroom 280:radiation 272:vibration 258:density, 42:talk page 791:Category 780:53529098 508:See also 472:fracture 452:Latch-up 311:derating 288:magnetic 284:pressure 264:humidity 529:Burn-in 351:burn-in 308:current 300:voltage 294:fields. 256:current 252:voltage 134:Please 778:  749:  306:, and 776:S2CID 747:S2CID 704:(PDF) 692:(PDF) 685:(PDF) 573:(PDF) 479:voids 304:power 276:shock 470:Die 448:HIRF 290:and 248:dust 768:doi 737:doi 450:), 364:AEC 321:); 244:gas 138:to 793:: 774:. 762:. 745:. 731:. 727:. 457:, 333:. 325:; 313:; 302:, 282:, 278:, 274:, 270:, 266:, 262:, 254:, 246:, 45:. 782:. 770:: 753:. 739:: 733:9 706:. 589:. 575:. 179:) 173:( 161:) 155:( 150:) 146:( 132:. 106:) 100:( 95:) 91:( 87:. 77:. 52:) 48:(

Index

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lead section
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make it understandable to non-experts
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Semiconductor
metallization
list of semiconductor materials
thin films
wire bonding
non-recurring engineering
time to market
economy of scale
gas
dust
voltage
current
temperature
humidity
mechanical stress
vibration
shock
radiation
pressure

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