516:(WTO), subject to the following modifications: the term of protection is at least 10 (rather than eight) years from the date of filing an application or of the first commercial exploitation in the world, but Members may provide a term of protection of 15 years from the creation of the layout-design; the exclusive right of the right-holder extends also to articles incorporating integrated circuits in which a protected layout-design is incorporated, in so far as it continues to contain an unlawfully reproduced layout-design; the circumstances in which layout-designs may be used without the consent of right-holders are more restricted; certain acts engaged in unknowingly will not constitute infringement.
141:
40:
538:(ii) 'layout-design (topography)' means the three-dimensional disposition, however expressed, of the elements, at least one of which is an active element, and of some or all of the interconnections of an integrated circuit, or such a three-dimensional disposition prepared for an integrated circuit intended for manufacture ...
535:(i) 'integrated circuit' means a product, in its final form or an intermediate form, in which the elements, at least one of which is an active element, and some or all of the inter-connections are integrally formed in and/or on a piece of material and which is intended to perform an electronic function,
560:
The United States Code (USC) defines a mask work as "a series of related images, however fixed or encoded, having or representing the predetermined, three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product, and in
479:
law, although any processes implemented in the work may be patentable. So since the 1990s, national governments have been granting copyright-like exclusive rights conferring time-limited exclusivity to reproduction of a particular layout. Terms of integrated circuit rights are usually shorter than
542:
Under the IPIC Treaty, each
Contracting Party is obliged to secure, throughout its territory, exclusive rights in layout-designs (topographies) of integrated circuits, whether or not the integrated circuit concerned is incorporated in an article. Such obligation applies to layout-designs that are
526:
Members agree to provide protection to the layout-designs (topographies) of integrated circuits (referred to in this
Agreement as "layout-designs") in accordance with Articles 2 through 7 (other than paragraph 3 of Article 6), Article 12 and paragraph 3 of Article 16 of the Treaty on Intellectual
650:
Note that the exclusive rights granted to mask work owners are more limited than those granted to copyright or patent holders. For instance, modification (derivative works) is not an exclusive right of mask work owners. Similarly, the exclusive right of a patentee to "use" an invention would not
546:
The
Contracting Parties must, as a minimum, consider the following acts to be unlawful if performed without the authorization of the holder of the right: the reproduction of the lay-out design, and the importation, sale or other distribution for commercial purposes of the layout-design or an
655:
of a mask work is specifically permitted by the law. As with copyright, mask work rights exist when they are created, regardless of registration, unlike patents, which only confer rights after application, examination and issuance.
543:
original in the sense that they are the result of their creators' own intellectual effort and are not commonplace among creators of layout designs and manufacturers of integrated circuits at the time of their creation.
561:
which the relation of the images to one another is such that each image has the pattern of the surface of one form of the semiconductor chip product" . Mask work exclusive rights were first granted in the US by the
815:
727:
Under one interpretation, a mask work containing a given game title is either entirely unoriginal, as mask ROM in general is likely a familiar design, or a minor variation of the mask work for any of the
547:
integrated circuit in which the layout-design is incorporated. However, certain acts may be freely performed for private purposes or for the sole purpose of evaluation, analysis, research or teaching.
711:(2) consists of designs that are staple, commonplace, or familiar in the semiconductor industry, or variations of such designs, combined in a way that, considered as a whole, is not original
475:
law (except perhaps as decorative art). Similarly, because individual lithographic mask works are not clearly protectable subject matter; they also cannot be effectively protected under
641:, a lawful owner of an authorized IC containing a mask work may freely import, distribute or use, but not reproduce the chip (or the mask). Mask work protection is characterized as a
205:
400:
930:
700:
exclusive rights in a work distributed in the form of a mask ROM would depend on an as yet untested interpretation of the originality requirement of § 902(b):
108:
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A trademark registration on the game's title and possibly other marks such as fanciful names of worlds and characters used in the game (e.g., PAC-MAN®);
80:
50:
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Ordinary copyright law applies to the underlying software (source, binary) and original characters and art. But the expiration date for the term of
505:
87:
577:
308:
844:
266:
94:
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225:
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for modern copyrighted works with a corporate authorship; alleged infringement of mask work rights are also not protected by a statutory
600:. Nevertheless, as fair use in copyrighted works was originally recognized by the judiciary over a century before being codified in the
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508:(WIPO) and to intergovernmental organizations meeting certain criteria. The Treaty has been incorporated by reference into the
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right, i.e., one created to protect specific rights where other (more general) laws were inadequate or inappropriate.
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A copyright registration on the program as a literary work or on the audiovisual displays generated by the work; and
886:
799:
has enacted Law No. 11484, of 2007, to regulate the protection and registration of integrated circuit topography.
496:, also called the Washington Treaty or IPIC Treaty. The Treaty, signed at Washington on May 26, 1989, is open to
210:
850:
513:
846:
TRIPS Articles Part II — Standards concerning the availability, scope and use of
Intellectual Property Rights
215:
185:
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637:: the right to reproduce the mask work or (initially) distribute an IC made using the mask work. Like the
286:
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Because of the functional nature of the mask geometry, the designs cannot be effectively protected under
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601:
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132:
140:
875:
Re
Centronics Systems Pty Ltd; Maurice Latin; Tiberio Salice and Fabrizio Latin v Nintendo Company Ltd
704:(b) Protection under this chapter (i.e., as a mask work) shall not be available for a mask work that—
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Property in
Respect of Integrated Circuits and, in addition, to comply with the following provisions.
433:
652:
638:
465:
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The IPIC Treaty is currently not in force, but was partially integrated into the TRIPS agreement.
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intellectual property law, a "mask work" is a two or three-dimensional layout or topography of an
854:
679:
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prohibit an independently created mask work of identical geometry. Furthermore, reproduction for
457:
429:
414:
360:
170:
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has the
Semiconductor Integrated Circuits Layout Design Act, 2000 for the similar protection.
604:, it is possible that the courts might likewise find a similar defense applies to mask work.
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878:
672:
624:
489:
453:
271:
464:, to permit or block the light at specific locations, sometimes for hundreds of chips on a
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relies on "The Act
Concerning the Circuit Layout of a Semiconductor Integrated Circuit".
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may seek simultaneous protection of its property under several legal constructs:
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Protection of circuit layout design legislation exists across the globe:
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design right protecting the design of materials was introduced by the
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The non-obligatory symbol used in a mask work protection notice is â“‚ (
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Mask work rights have more in common with copyrights than with other
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671:. On the other hand, they are used alongside copyright to protect a
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Agreement on Trade-Related
Aspects of Intellectual Property Rights
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Australian law refers to mask works as "eligible layouts" or ELs.
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Treaty on
Intellectual Property in Respect of Integrated Circuits
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The exclusive rights in a mask work are somewhat like those of
675:(ROM) component that is encoded to contain computer software.
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Article 2 of the IPIC Treaty gives the following definitions:
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A mask work registration on the ROM that contains the binary.
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Article 35 of TRIPS in Relation to the IPIC Treaty states:
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61:
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processes, the multiple etched layers within actual
432:(IC or "chip"), i.e. the arrangement on a chip of
678:The publisher of software for a cartridge-based
928:Text of the Washington Treaty on IC protection
448:and interconnections. The layout is called a
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77:"Integrated circuit layout design protection"
8:
66:introducing citations to additional sources
191:Integrated circuit layout design protection
460:are each created using a mask, called the
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781:which is transposed in all member states.
563:Semiconductor Chip Protection Act of 1984
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506:World Intellectual Property Organization
56:Relevant discussion may be found on the
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309:Limitations and exceptions to copyright
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267:Artificial intelligence and copyright
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488:A diplomatic conference was held at
226:Supplementary protection certificate
29:IP protections for computer hardware
480:copyrights applicable on pictures.
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744:Equivalent legislation exists in
417:are a field in the protection of
413:Layout designs (topographies) of
805:has the Topographies Act of 1992
356:Outline of intellectual property
181:Indigenous intellectual property
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49:relies largely or entirely on a
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1:
723:, as of November 2010).
625:HTML numeric character entity
584:defense, nor by the typical
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304:Idea–expression distinction
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887:Federal Court (Full Court)
950:Intellectual property law
933:January 21, 2012, at the
851:World Trade Organization
514:World Trade Organization
708:(1) is not original; or
216:Plant genetic resources
186:Industrial design right
176:Geographical indication
879:[1992] FCA 584
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611:enclosed in a circle;
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287:Criticism of copyright
211:Plant breeders' rights
857:on September 24, 2021
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602:Copyright Act of 1976
588:copy exemptions that
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419:intellectual property
133:Intellectual property
62:improve this article
955:Integrated circuits
904:www.fedlex.admin.ch
779:Directive 87/54/EEC
653:reverse engineering
639:first sale doctrine
444:components such as
415:integrated circuits
277:Copyright abolition
680:video game console
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369:Higher categories:
361:Outline of patents
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51:single source
47:This article
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907:. Retrieved
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324:Paraphrasing
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775:sui generis
644:sui generis
628:Ⓜ
615:code point
438:transistors
336:Orphan work
262:Abandonware
231:Trade dress
944:Categories
828:References
721:§ 902
698:additional
669:trademarks
630:) or *M*.
594:§ 117
574:§ 904
442:electronic
88:newspapers
909:April 24,
754:Hong Kong
746:Australia
635:copyright
473:copyright
462:photomask
446:resistors
297:Biopiracy
241:Trademark
161:Copyright
58:talk page
18:Mask work
931:Archived
900:"Fedlex"
810:See also
663:such as
582:fair use
436:such as
373:Property
319:Fair use
156:Copyleft
118:May 2014
818:(TRIPS)
769:In the
665:patents
621:U+1F1AD
613:Unicode
512:of the
500:of the
102:scholar
797:Brazil
764:Canada
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109:JSTOR
95:books
911:2023
863:2008
773:, a
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450:mask
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81:news
883:FCR
762:In
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458:ICs
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64:by
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