Knowledge (XXG)

Junctionless nanowire transistor

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The JNT uses a simple nanowire of silicon surrounded by an electrically isolated "wedding ring" that acts to gate the flow of electrons through the wire. This method has been described as akin to squeezing a garden hose to gate the flow of water through the hose. The nanowire is heavily n-doped, making it an excellent conductor. Crucially the gate, comprising silicon, is heavily p-doped; and its presence depletes the underlying silicon nanowire thereby preventing carrier flow past the gate.
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has a gate junction, although its gate is electrically insulated from the controlled region.) Junctions are difficult to fabricate, and, because they are a significant source of current leakage, they waste significant power and heat. Eliminating them held the promise of cheaper and denser microchips.
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Kranti, A.; Yan, R.; Lee, C. -W.; Ferain, I.; Yu, R.; Dehdashti Akhavan, N.; Razavi, P.; Colinge, J. P. (2010). "Junctionless nanowire transistor (JNT): Properties and design guidelines".
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Colinge, J. P.; Kranti, A.; Yan, R.; Lee, C. W.; Ferain, I.; Yu, R.; Dehdashti Akhavan, N.; Razavi, P. (2011). "Junctionless Nanowire Transistor (JNT): Properties and design guidelines".
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A Junction-Less Vertical Nano-Wire FET (JLVNFET) manufacturing process was developed in Laboratory for Analysis and Architecture of Systems (LAAS).
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The JNT uses bulk conduction instead of surface channel conduction. The current drive is controlled by doping concentration and not by
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Larrieu, Guilhem; Han, X.-L. (2013). "Vertical nanowire array-based field effect transistors for ultimate scaling".
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Thus the device is turned off not by reverse bias voltage applied to the gate, as in the case of conventional
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but by full depletion of the channel. This depletion is caused due to work-function difference (
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Yu, Ran (2013). "Junctionless nanowire transistor fabricated with high mobility Ge channel".
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2010 Proceedings of the European Solid State Device Research Conference
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Junctionless Nanowire Transistor: Properties and Device Guidelines
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Multiple JLNT devices were manufactured in various labs:
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Germanium has been used instead of silicon nanowires.
327: 8: 334: 320: 106: 302:This electronics-related article is a 283:Ferain Junctionless Transistors (pdf) 39:Tyndall National Institute in Ireland 7: 292: 290: 306:. You can help Knowledge (XXG) by 14: 17:Junction-Less nanowire transistor 294: 1: 124:10.1109/ESSDERC.2010.5618216 379: 289: 247:Physica Status Solidi RRL 224:10.1016/j.sse.2011.06.004 208:Solid-State Electronics 21:Field-effect transistor 259:10.1002/pssr.201300119 75:Electrical Behaviour 19:(JLNT) is a type of 216:2011SSEle..65...33C 161:2013Nanos...5.2437L 169:10.1039/c3nr33738c 85:Contact_potentials 363:Electronics stubs 315: 314: 133:978-1-4244-6658-0 370: 353:Transistor types 336: 329: 322: 298: 291: 271: 270: 242: 236: 235: 210:. 65–66: 33–37. 203: 197: 196: 155:(6): 2437–2441. 144: 138: 137: 111: 92:gate capacitance 58:junction. (Even 31:Existing devices 378: 377: 373: 372: 371: 369: 368: 367: 358:Nanoelectronics 343: 342: 341: 340: 287: 275: 274: 244: 243: 239: 205: 204: 200: 146: 145: 141: 134: 118:. p. 357. 113: 112: 108: 103: 77: 69: 41: 33: 12: 11: 5: 376: 374: 366: 365: 360: 355: 345: 344: 339: 338: 331: 324: 316: 313: 312: 299: 273: 272: 237: 198: 139: 132: 105: 104: 102: 99: 76: 73: 68: 65: 40: 37: 32: 29: 13: 10: 9: 6: 4: 3: 2: 375: 364: 361: 359: 356: 354: 351: 350: 348: 337: 332: 330: 325: 323: 318: 317: 311: 309: 305: 300: 297: 293: 288: 285: 284: 280: 279: 268: 264: 260: 256: 252: 248: 241: 238: 233: 229: 225: 221: 217: 213: 209: 202: 199: 194: 190: 186: 182: 178: 174: 170: 166: 162: 158: 154: 150: 143: 140: 135: 129: 125: 121: 117: 110: 107: 100: 98: 95: 93: 88: 86: 82: 74: 72: 66: 64: 61: 57: 53: 49: 45: 38: 36: 30: 28: 26: 22: 18: 308:expanding it 301: 286: 281: 276: 250: 246: 240: 207: 201: 152: 148: 142: 115: 109: 96: 89: 78: 70: 54:that has no 43: 42: 34: 16: 15: 347:Categories 101:References 52:transistor 253:: 65–68. 185:2040-3364 177:2040-3372 149:Nanoscale 267:93197577 193:23403487 48:nanowire 25:junction 232:8382657 212:Bibcode 157:Bibcode 50:-based 265:  230:  191:  183:  175:  130:  81:MOSFET 60:MOSFET 263:S2CID 228:S2CID 173:eISSN 46:is a 304:stub 189:PMID 181:ISSN 128:ISBN 67:LAAS 56:gate 255:doi 220:doi 165:doi 120:doi 44:JLT 349:: 261:. 249:. 226:. 218:. 187:. 179:. 171:. 163:. 151:. 126:. 94:. 27:. 335:e 328:t 321:v 310:. 269:. 257:: 251:8 234:. 222:: 214:: 195:. 167:: 159:: 153:5 136:. 122::

Index

Field-effect transistor
junction
nanowire
transistor
gate
MOSFET
MOSFET
Contact_potentials
gate capacitance
doi
10.1109/ESSDERC.2010.5618216
ISBN
978-1-4244-6658-0
Bibcode
2013Nanos...5.2437L
doi
10.1039/c3nr33738c
eISSN
2040-3372
ISSN
2040-3364
PMID
23403487
Bibcode
2011SSEle..65...33C
doi
10.1016/j.sse.2011.06.004
S2CID
8382657
doi

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