588:) which in turn is used to generate micro patterns and microstructures. The techniques described below are limited to one stage. The consequent patterning on the same surfaces is difficult due to misalignment problems. The soft lithography isn't suitable for production of semiconductor-based devices as it's not complementary for metal deposition and etching. The methods are commonly used for chemical patterning.
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Optical
Lithography (or photolithography) is one of the most important and prevalent sets of techniques in the nanolithography field. Optical lithography contains several important derivative techniques, all that use very short light wavelengths in order to change the solubility of certain molecules,
353:
Since then, photolithography has become the most commercially successful technique, capable of producing sub-100 nm patterns. There are several techniques associated with the field, each designed to serve its many uses in the medical and semiconductor industries. Breakthroughs in this field
433:
Quantum optical lithography (QOL), is a diffraction-unlimited method able to write at 1 nm resolution by optical means, using a red laser diode (λ = 650 nm). Complex patterns like geometrical figures and letters were obtained at 3 nm resolution on resist substrate. The method was applied to
643:(NIL), and its variants, such as Step-and-Flash Imprint Lithography and laser assisted directed imprint (LADI) are promising nanopattern replication technologies where patterns are created by mechanical deformation of imprint resists, typically monomer or polymer formations that are
345:
techniques have been around since the late 18th century, none were applied to nanoscale structures until the mid-1950s. With evolution of the semiconductor industry, demand for techniques capable of producing micro- and nano-scale structures skyrocketed.
354:
contribute significantly to the advancement of nanotechnology, and are increasingly important today as demand for smaller and smaller computer chips increases. Further areas of research deal with physical limitations of the field, energy harvesting, and
489:
have as a goal an increase of throughput for semiconductor mass-production. EBL can be utilized for selective protein nanopatterning on a solid substrate, aimed for ultrasensitive sensing. Resists for EBL can be hardened using
545:
This technique uses a focused beam of high energy (MeV) protons to pattern resist material at nanodimensions and has been shown to be capable of producing high-resolution patterning well below the 100 nm mark.
562:
or broad beam of energetic lightweight ions (like He) for transferring pattern to a surface. Using Ion Beam
Proximity Lithography (IBL) nano-scale features can be transferred on non-planar surfaces.
1111:
Parikh, D.; Craver, B.; Nounu, H.N.; Fong, F.O.; Wolfe, J.C. (2008). "Nanoscale pattern definition on nonplanar surfaces using ion beam proximity lithography and conformal plasma-deposited resist".
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Soh, Hyongsok T.; Guarini, Kathryn Wilder; Quate, Calvin F. (2001), Soh, Hyongsok T.; Guarini, Kathryn Wilder; Quate, Calvin F. (eds.), "Introduction to
Scanning Probe Lithography",
366:
From Greek, the word nanolithography can be broken up into three parts: "nano" meaning dwarf, "lith" meaning stone, and "graphy" meaning to write, or "tiny writing onto stone."
886:
Pavel, E; Jinga, S; Vasile, B S; Dinescu, A; Marinescu, V; Trusca, R; Tosa, N (2014). "Quantum
Optical Lithography from 1 nm resolution to pattern transfer on silicon wafer".
425:(NGL) technique due to its ability to produce structures accurately down below 30 nanometers at high throughput rates which makes it a viable option for commercial purposes.
337:
The NL has evolved from the need to increase the number of sub-micrometer features (e.g. transistors, capacitors etc.) in an integrated circuit in order to keep up with
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of the resist and subsequent selective removal of material by immersion in a solvent, sub-10 nm resolutions have been achieved. This form of direct-write,
515:, either by etching away unwanted material, or by directly-writing new material onto a substrate. Some of the important techniques in this category include
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The modern term reflects on a design of structures built in range of 10 to 10 meters, i.e. nanometer scale. Essentially, the field is a derivative of
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Wolfe, J.C.; Craver, B.P. (2008). "Neutral particle lithography: a simple solution to charge-related artefacts in ion beam proximity printing".
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define the spatial distribution and shape of the applied magnetic field. The second component is ferromagnetic nanoparticles (analog to the
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causing them to wash away in solution, leaving behind a desired structure. Several optical lithography techniques require the use of
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42:
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Bardea, A.; Yoffe, A. (2017). "Magneto–Lithography, a Simple and
Inexpensive Method for High Throughput, Surface Patterning".
89:
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46:
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which deposits a narrow track of chemical from a reservoir onto the substrate according to the movement pattern programmed.
61:
725:) as evaporation masks. This method has been used to fabricate arrays of gold nanodots with precisely controlled spacings.
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excitations to generate beyond-diffraction limit patterns, benefiting from subwavelength field confinement properties of
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Neutral particle lithography (NPL) uses a broad beam of energetic neutral particle for pattern transfer on a surface.
619:
422:
144:
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921:
Pavel, E; Prodan, G; Marinescu, V; Trusca, R (2019). "Recent advances in 3- to 10-nm quantum optical lithography".
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is a resist-less and parallel method of fabricating nanometer scale patterns using nanometer-size apertures as
272:
858:"ASML: Press – Press Releases – ASML reaches agreement for delivery of minimum of 15 EUV lithography systems"
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1446:
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Xie, Zhihua; Yu, Weixing; Wang, Taisheng; et al. (31 May 2011). "Plasmonic nanolithography: a review".
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As of 2021 photolithography is the most heavily used technique in mass production of microelectronics and
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Electron beam lithography (EBL) or electron-beam direct-write lithography (EBDW) scans a focused beam of
964:
Pavel, E; Marinescu, V; Lungulescu, M (2019). "Graphene nanopatterning by
Quantum Optical Lithography".
608:
511:(SPL) is another set of techniques for patterning at the nanometer-scale down to individual atoms using
394:
999:
Shafagh, Reza; Vastesson, Alexander; Guo, Weijin; van der
Wijngaart, Wouter; Haraldsson, Tommy (2018).
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on the substrate using paramagnetic metal masks call "magnetic mask". Magnetic mask which is analog to
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was applied to these structures for the first time in 1958 beginning the age of nanolithography.
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685:) that are assembled onto the substrate according to the field induced by the magnetic mask.
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dealing with the engineering (patterning e.g. etching, depositing, writing, printing etc) of
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659:. Nanoimprint lithography is capable of producing patterns at sub-10 nm levels.
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Loh, O.Y.; Ho, A.M.; Rim, J.E.; Kohli, P.; Patankar, N.A.; Espinosa, H.D. (2008).
1001:"E-Beam Nanostructuring and Direct Click Biofunctionalization of Thiol–Ene Resist"
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Hatzor-de
Picciotto, A.; Wissner-Gross, A.D.; Lavallee, G.; Weiss, P.S. (2007).
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This set of techniques include ion- and electron-projection lithographies.
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has high resolution and low throughput, limiting single-column e-beams to
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A nanofountain probe is a micro-fluidic device similar in concept to a
531:. Dip-pen nanolithography is the most widely used of these techniques.
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1249:"Arrays of Cu(2+)-complexed organic clusters grown on gold nano dots"
421:(EUVL). This last technique is considered to be the most important
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584:. Elastomers are used to make a stamp, mold, or mask (akin to
18:
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light during imprinting. This technique can be combined with
409:(OPC). Some of the included techniques in this set include
1050:, Microsystems, vol. 7, Springer US, pp. 1–22,
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materials made from different chemical compounds such as
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on a surface covered with an electron-sensitive film or
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Used to create structures that only measure nanometers
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Advances in imaging and electron physics. Volume 164
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49:. Unsourced material may be challenged and removed.
1194:Proceedings of the National Academy of Sciences
673:Magnetolithography (ML) is based on applying a
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417:, light coupling nanolithography (LCM), and
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829:"Jay W. Lathrop | Computer History Museum"
434:nanopattern graphene at 20 nm resolution.
306:) is a growing field of techniques within
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1114:Journal of Microelectromechanical Systems
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469:) to draw custom shapes. By changing the
109:Learn how and when to remove this message
1371:) is being considered for deletion. See
314:-scale structures on various materials.
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481:fabrication, low-volume production of
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329:and other miscellaneous techniques.
213:List of semiconductor scale examples
47:adding citations to reliable sources
1256:Journal of Experimental Nanoscience
1146:IEEE Transactions on Nanotechnology
399:resolution enhancement technologies
525:thermal scanning probe lithography
14:
1375:to help reach a consensus. ›
492:sequential infiltration synthesis
487:Multiple-electron beam approaches
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485:, and research and development.
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208:Semiconductor device fabrication
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908:10.1016/j.optlastec.2014.01.016
529:local oxidation nanolithography
419:extreme ultraviolet lithography
124:Part of a series of articles on
34:needs additional citations for
1564:Lithography (microfabrication)
721:of spheres (typically made of
521:thermochemical nanolithography
1:
1311:10.1088/0022-3727/41/2/024007
1097:10.1016/S1369-7021(07)70129-3
923:J. Micro/Nanolith. MEMS MOEMS
799:. Amsterdam: Academic Press.
729:Neutral particle lithography
717:Nanosphere lithography uses
550:Charged-particle lithography
407:optical proximity correction
1056:10.1007/978-1-4757-3331-0_1
978:10.1016/j.ijleo.2019.163532
747:Plasmonic lithography uses
620:Multilayer soft lithography
614:Multilayer soft lithography
429:Quantum optical lithography
423:next generation lithography
164:Solid-state nanoelectronics
145:Molecular scale electronics
136:Single-molecule electronics
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1048:Scanning Probe Lithography
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1127:10.1109/JMEMS.2008.921730
1078:Watt, Frank (June 2007).
943:10.1117/1.JMM.18.2.020501
793:Hawkes, Peter W. (2010).
743:Plasmonic nanolithography
719:self-assembled monolayers
449:Electron beam lithography
443:Electron-beam lithography
1373:templates for discussion
625:Miscellaneous techniques
325:, scanning lithography,
1477:Molecular self-assembly
1215:10.1073/pnas.0806651105
1017:10.1021/acsnano.8b03709
935:2019JMM&M..18b0501P
833:www.computerhistory.org
641:Nanoimprint lithography
636:Nanoimprint lithography
630:Nanoimprint lithography
517:dip-pen nanolithography
411:multiphoton lithography
1299:J. Phys. D: Appl. Phys
713:Nanosphere lithography
707:Nanosphere lithography
576:Soft lithography uses
263:Electronics portal
1080:"Proton Beam Writing"
737:Plasmonic lithography
609:Microcontact printing
603:Microcontact printing
483:semiconductor devices
382:semiconductor devices
689:Nanofountain drawing
582:polydimethylsiloxane
556:Ion beam lithography
475:maskless lithography
438:Scanning lithography
150:Molecular logic gate
43:improve this article
1268:2007JENan...2....3P
1206:2008PNAS..10516438L
1159:2017ITNan..16..439B
900:2014OptLT..60...80P
770:Stencil lithography
765:Stencil lithography
759:Stencil lithography
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535:Proton beam writing
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222:Related approaches
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36:verification
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1522:Proton beam
1447:Multiphoton
1442:Nanoimprint
1361:‹ The
1262:(1): 3–11.
723:polystyrene
683:Photoresist
647:by heat or
339:Moore's Law
319:lithography
198:Moore's law
99:August 2021
1517:Nanosphere
1326:Plasmonics
972:: 163532.
872:2015-05-11
838:2019-03-18
780:References
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455:electrons
362:Etymology
356:photonics
312:nanometer
178:Nanowires
1558:Category
1531:See also
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1363:template
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341:. While
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